CARBON ION IRRADIATION EFFECTS ON PULSED LASER DEPOSITED TITANIUM NITRIDE THIN FILMS
Pulse laser deposited thin films of TiN are irradiated by 1 MeV carbon (C+) ions beam for various doses ranging 0.4 to 2.8 × 1014 ions/cm2. Atomic force microscopy (AFM) analysis reveals the formation of hillocks like structures after ion irradiation. X-ray diffraction (XRD) investigations show that the film crystallinity increases for lower doses ranging from 0.4 to 1.2 × 1014 ions/cm2 and decreases for higher doses (2 to 2.8 × 1014 ions/cm2) of ions. No new bands are identified from Raman spectroscopy. However, a noticeable change in microhardness has been observed. The hillock densities as well as hardness are strongly dependent upon ion dose.
Year of publication: |
2015
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Authors: | MAHMOOD, KHALIQ ; BASHIR, SHAZIA ; AKRAM, MAHREEN ; HAYAT, ASMA ; FAIZAN-Ul-HAQ ; SAADAT, SHAHZAD |
Published in: |
Surface Review and Letters (SRL). - World Scientific Publishing Co. Pte. Ltd., ISSN 1793-6667. - Vol. 22.2015, 02, p. 1550020-1
|
Publisher: |
World Scientific Publishing Co. Pte. Ltd. |
Subject: | Pulsed laser deposition | titanium nitride | C+ ion irradiation | nano hillocks | structural modification |
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