TRANSPORT PROPERTIES OF CrO2 (100) FILM GROWN ON TiO2 BY A SIMPLE ATMOSPHERE PRESSURE CHEMICAL VAPOR DEPOSITION
Epitaxial CrO2 (100)-oriented film was successfully fabricated on TiO2 (100) substrate by a simple chemical vapor deposition in a two-zone furnace with oxygen flow from a CrO3 precursor. The transport measurements show that the CrO2 film is metallic with a small residual resistivity 4 μΩ cm down to 0.6 K. The temperature dependence of resistivity was best described by a phenomenological expression ρ(T) = ρ0 + AT2 exp(-Δ/T) over the range of 0.6–300 K with Δ = 123.6 K. The magnetization of the film becomes saturated in a relatively low field with a small coercive field. The temperature dependence of magnetization shows Bloch's T3/2 law and the slope of the curve suggests a critical wavelength of λΔ ~ 26.6 Å beyond which spin-flip scattering becomes important.
Year of publication: |
2014
|
---|---|
Authors: | XIE, LIANG ; ZHANG, JIN ZHI ; CUI, NAI YI ; ZHANG, HONG GUANG |
Published in: |
Surface Review and Letters (SRL). - World Scientific Publishing Co. Pte. Ltd., ISSN 1793-6667. - Vol. 21.2014, 04, p. 1450055-1
|
Publisher: |
World Scientific Publishing Co. Pte. Ltd. |
Subject: | CrO2 (100) film | transport properties | magnetic properties |
Saved in:
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