Lee, Youn-Jung; Park, Hyeongsik; Ju, Minkyu; Kim, Youngkuk - In: Energy 66 (2014) C, pp. 20-24
by mixing the HF with an H2SiO3 solution. We achieved a high haze value of 74.6% at a 540 nm wavelength by increasing the … etching time and HF concentration. A haze value of about 58% was achieved at a 800 nm wavelength when vapor texturing was used …. The ZnO:Al film texture by HCl had a haze ratio of about 9.5% at 800 nm and less than 40% at 540 nm. In addition to a low …