Kumar, Akash; Lee, Ji Ye; Lee, Sang Yeol - 2022
The effect of post annealing treatment on the phase transformation and the electrical properties of the sputtered HfO2 is investigated. As-deposited HfO2 films were annealed at 200 and 400[[EQUATION]]C in ambient conditions. Film annealed at 200[[EQUATION]]C retains its amorphous nature however,...