Ahmad, A.; Alsaad, A. - In: The European Physical Journal B - Condensed Matter and … 52 (2006) 1, pp. 41-46
Zinc oxide thin films were sputter deposited on (100) silicon substrates at 250 <Superscript>○</Superscript>C substrates temperature via reactive unbalanced dc magnetron process using pure zinc target and argon/oxygen gases. The influence of the applied dc sputtering power (between 100 to 250 Watts, step 50 Watts) on...</superscript>
