The aim of this study is the formation of porous silicon (PS) and the heat treatment effect on the optical properties of the PS layer. An optimized HF:HNO3 chemical solution is used at ambient temperature on the n + p silicon surface. Scanning electron microscopy (SEM) pictures show the form of...

In this work, our aim was to determine the deposition parameters leading to optimal optical properties of Silicon nitride (SiN) film for photovoltaic application. The deposition was performed in an industrial pulsed direct-PECVD using a gas mixture of NH3/SiH4.