LARGE AREA PARALLEL SURFACE NANOSTRUCTURING WITH LASER IRRADIATION THROUGH MICROLENS ARRAYS
In the past decade, the development of nanoelectronics and nano-optics has attracted much interest in surface nanostructuring of semiconductor materials. The irradiation of a microlens array by a laser beam generates many focused light spots, which can act as a direct writing tool on photo-polymer materials. This maskless surface nanostructuring technique enables thousands to millions of identical nano-features to be patterned in a couple of laser pulses. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) images show that nano-features were patterned uniformly on the substrate surface, which suggests a versatile way of parallel surface nanostructuring over a large area. The simulation results of the energy flux distribution at the focal plane of the microlens arrays will also be discussed.
Year of publication: |
2010
|
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Authors: | LIM, C. S. ; HONG, M. H. ; LIN, Y. ; TAN, L. S. ; KUMAR, A. SENTHIL ; RAHMAN, M. |
Published in: |
Surface Review and Letters (SRL). - World Scientific Publishing Co. Pte. Ltd., ISSN 1793-6667. - Vol. 17.2010, 03, p. 383-387
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Publisher: |
World Scientific Publishing Co. Pte. Ltd. |
Subject: | Microlens arrays | nanopatterning |
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