Reentrant oscillation in kinetic thin-film deposition
We have studied the origin of reentrant growth oscillation in kinetic thin-film deposition on stepped surfaces using a Monte Carlo simulation. The results show that reentrant oscillation occurs as a result of growth modes competition between two-dimension-nucleation growth and step-flow growth due to a variation of surface-diffusion-length with deposition temperature, and that it is a natural phenomenon in non-equilibrium thin-film deposition on a substrate with a permanent step source.
Year of publication: |
1996
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Authors: | Xiao, Rong-Fu |
Published in: |
Physica A: Statistical Mechanics and its Applications. - Elsevier, ISSN 0378-4371. - Vol. 229.1996, 2, p. 236-243
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Publisher: |
Elsevier |
Subject: | Monte Carlo simulation | Surface growth morphologies | Surface roughening and surface diffusion |
Saved in:
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