Stylized Facts of U.S. Patenting – Issue Rates, Entry Pendency, Characteristics of Office Actions, Examiner Citations and Child Continuations across Technology Centres and Geographies
Year of publication: |
2020
|
---|---|
Authors: | Shah, Anand ; Bahri, Anu |
Publisher: |
[S.l.] : SSRN |
Subject: | USA | United States | Patent | Technologiepark | Technology park |
Extent: | 1 Online-Ressource (45 p) |
---|---|
Type of publication: | Book / Working Paper |
Language: | English |
Notes: | Nach Informationen von SSRN wurde die ursprüngliche Fassung des Dokuments May 14, 2020 erstellt |
Other identifiers: | 10.2139/ssrn.3600769 [DOI] |
Classification: | O3 - Technological Change; Research and Development ; L1 - Market Structure, Firm Strategy, and Market Performance ; L2 - Firm Objectives, Organization, and Behavior |
Source: | ECONIS - Online Catalogue of the ZBW |
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