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Vanadium oxide
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phase
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temperature coefficient of resistance (TCR)
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vacuum annealing
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LI, M. C.
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PHASE TRANSFORMATION AND R–T CHARACTERISTICS OF VACUUM ANNEALED VANADIUM OXIDE THIN FILMS
WANG, Y. L.
;
LI, M. C.
;
ZHAO, L. C.
- In:
Surface Review and Letters (SRL)
15
(
2008
)
01
,
pp. 59-64
) substrates at 430°C using magnetron sputtering. By
vacuum
annealing
on as-deposited VOx thin films at 450°C, at different …
Persistent link: https://www.econbiz.de/10005050582
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