The effect of substrate temperature on the structural, optical and morphological properties of ZnO thin films has been investigated. ZnO thin films were deposited on quartz substrate for various temperatures ranging from room temperature to 250°C by pulsed laser deposition (PLD) technique....

Pulse laser deposited thin films of TiN are irradiated by 1 MeV carbon (C+) ions beam for various doses ranging 0.4 to 2.8 × 1014 ions/cm2. Atomic force microscopy (AFM) analysis reveals the formation of hillocks like structures after ion irradiation. X-ray diffraction (XRD) investigations show...