Co-creation as a risk-sharing strategy for the development of innovative EUV lithography technology in the semiconductor industry
Year of publication: |
2015
|
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Authors: | Banerjee, Subhojit ; Sharma, Anuj K. |
Published in: |
Technology analysis & strategic management. - Abingdon, Oxfordshire : Routledge, Taylor & Francis, ISSN 0953-7325, ZDB-ID 32138-2. - Vol. 27.2015, 9, p. 1097-1113
|
Subject: | co-creation | NTD | risk-sharing | EUV | ASML | Halbleiterindustrie | Semiconductor industry | Kundenintegration | Customer integration | Innovationsmanagement | Innovation management | Innovation | Risiko | Risk | Halbleiter | Semiconductor | Betriebliche Wertschöpfung | Value creation |
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